Thin film calculation

Thin film stack model: reflectivity/transmissivity online calculation for light incident at an arbitrary angle on a thin film stack.
The algorithm returns full reflected/transmitted field, power, polarization, and phase information for incident TE (perp, or s) and TM (para or p) waves. Input power is unitary and flat across the spectrum unless centre_lambda box in section 1 below is blank.
There are up several sets of information to be entered:
    1 Incident angle, centre wavelength(lambda), wavelength(lambda) sweep range, and number of points(max 20) to compute across the wavelength sweep range.
    2 Complex index of refraction of incident medium (n,k). For air, n=1 and k=0 is a good approximation.
    3a Thin film stack. Enter stack information using the following notation, where the top film is closest to the incident medium (see examples below):
Fixed index on each layer: notation Fully dispersive calculation: notation Convenient repeated H/L film notation: great for repeated high/low in thin film stacks
thickness1, n1,k1
thickness2, n2,k2
thickness3, n3,k3
thickness1, {Material1}
thickness2, n2,k2
thickness3, {Material3}

Deposition materials currently available are: Ag,Al,Au,Cr,Cu,GaAs,ITO,Mo,Ni,Si,Si3N4,SiO2a,Ti. (SiO2a is amorphous SiO2)
Contact Luxpop to get your favourite material added.
NOTE: if '{ }' characters do not work on your system, use '( )' characters.
In box 2a, define the "H" and "L" films. In the main entry box 3a, it is then much easier to define alternating stacks and adjust quickly.
4 Complex index of refraction of substrate (ns,ks): either enter a fixed value OR leave the ns,ks fields blank and choose a substrate material for a fully dispersive calculation.
Luxpop can usually do more layers or steps for fixed index layers compared to dispersive material layers, depending on system activity.
    Here are some examples of thin film stacks. Feel free to cut and paste into the " 3a" box below.
Example#1: Fixed index layers(Born & Wolf, Principles of Optics, 9th Ed. p. 74) stack of 1/4 wavelength (for lambda=546 nm) High n / low n materials at n= 2.3 and 1.35

    59.348,2.3,0
    101.11,1.35,0
    59.348,2.3,0
    101.11,1.35,0
    59.348,2.3,0
Example #2: Specify material using {Material} notation on some or all the layers to obtain dispersive calculations. Cut and paste into box #3a below.

    5.348,{Al}
    101.11,1.35,0
    5.348,{Ag}
    101.11,1.35,0
    59.348,2.3,0
Example #3: predefined H/L layers. Define H and L films in boxes 2b below, then use those in your stack definition. Example below is equivalent to example #1 on the left, if H=> 59.348,2.3,0 and L=>101.11,1.35,0. Cut and paste into box #3a below to try.

    H
    L
    H
    L
    H

1 incident angle: deg    centre_lambda: nm    lambda sweep range: +/-nm;    # sweep pts:
2a index of incident material (eg air) n:     k:
2b Predefined layers:  H:     L:  

3a Enter the thin film stack text information into the box below
3b Optional: custom power spectral profile of input.
* If centre_lambda in section 1 above is kept blank, the information in this box to the right will be used and will override the wavelength sweep range and the # of points.
* Max 15 wavelengths.
* Wavelengths must be monotonically increasing, but do not need to be uniformly spaced.
* Input power must be in linear units. Output power will be in the same units as input power.
* Format as follows:
lambda1,power1
lambda2,power2
lambda3,power3
...
Feel free to overwrite sample text in box==>

4 index of susbtrate material (eg glass) ns:     ks:     >OR
  leave the ns,ks fields blank and select a substrate material: