20/Feb/2014 added index of refraction of ATO [antimony (Sb)-doped tin oxide (6 wt.% Sb2O3-doped SnO2)], from the Leem, Lee et al ref (Kyung Hee/Sungkyunkwan/KANFC). ATO is used as a seed layer to generate gallium oxide hydroxide (GaOOH) nanopillars for the purpose of anti-reflection coatings that can be fabricated using a cost-effective, simple and low temperature deposition method. For ATO, values of n in the 1.7 to 1.9 can be obtained across the solar spectrum, with extremely low loss k.

17/Jan/2014 added new function called "filtpix" to code entry, which allows user to select a nanostructured filter under various conditions and determine behaviour such as reflection or transmission. As a first example the function implements selected filter pixels in the Girard-Desprolet, Boutami et al ref from Minatec, which consist of cross-holes nanostructured metallic filters. This ref elegantly demonstrates the flexibility of these structures and the design freedom granted by these new metamaterials: instead of growing expensive complex multi-layered structures, it is possible to use CMOS fabrication technology to implement designs of arbitrary functionality at a lower cost and with higher repeatability, leveraging existing industrial infrastructure. Click on the fading pixel picture below beside the code entry window for samples.

18/Dec/2013 feedback from Chien: I like to use the OPO Op point to calculate the PPLN grating period{ed: Optical Parametric Oscillators on periodically poled lithium niobate}. (Can you bring it back?) Reply: this calculation had been deactivated some time ago because it was not very popular, but has now been brought back per this and other requests. It is now operational again. Thank you for the feedback.

16/Dec/2013 added index of refraction of negative index plasmonic metamaterial thin film with subwavelength nanonotch structures. For the purposes of index calculation on this site, this material is called p1985_6Au_5Kap_8nn, given its unit cell's 1985 nm outside dimension, 6 gold and 5 kapton layers and 8 nanonotches. With this material, designers have engineered a broad flat passband in the 3000 to 3700 nm range with smooth transition of the real index index of refraction from +1 to -1 within the passband, illustrating the degree of spectral control possible with techniques as described in the ref. From the Jiang, Lin et al ref, of Penn State.

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