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At a wavelength of 633 nm (1.959 eV) and a temperature of 25 deg C (298.15 deg K), the index of refraction of amorphous SiO2 is n = 1.45708 + / - 3e-05.
Answer obtained using the dispersion formula at 20 C in the reference then modifying given a dn/dT of 1.28 X 10-5/C for UVGSFS. This is valid for small changes about room temperature.

Reference:
[1] I. H. Malitson, "Interspecimen comparison of the refractive index of fused silica," J. Opt. Soc. Am. 55, no. 10 (October 1965), pp. 1205-1209.

Values may vary considerably depending on fabrication. Thin films may have different index of refraction values when compared to bulk components.

Absorption peaks can be found at 119 nm, 9300 nm, 12500 nm, 22150 nm, and 25350 nm.

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